| Image | Series Name | Parts Number | Size(mm3) | Spec-sheet |
![]() |
Epi Wafer | Undoped GaN | 2″ (50.8㎜) |
| Characteristics (at 25℃) |
| Parameter | Typ. | Test Conditions | |
| PL measurement | Peak wavelength | 362nm±2nm | Accent RPM2000 – Laser : 266nm Nd-YG – 3mm Edge Exclude |
| Uniformity STD | <3% | ||
| FWHM | <10㎚ | ||
| FWHM STD | <3% | ||
| Thickness | Thickness | 2㎛+/-10% | |
| Thickness STD | <10% | ||
| XRD | (002) | <350 arcsec | Panalytical HRXRD |
| (102) | <450 arcsec | ||
| Hall | Carrier Concentration | < -1×1017 /㎝ | Accent HL5500 |
| Mobility | >200 ㎠/V·sec | ||
| Doping material | Si | N/A | – |
| Mg | N/A | ||


